Abstract: As a pretreatment process of ballast water treatment, the performance of high gradient magnetic separation (HGMS) technology for the removal of particulates and microorganisms was studied. The results showed that HGMS process could effectively remove suspended particles larger than 5 µm and had ability to resist impact load. Microorganism could also be effectively removed by HGMS process, and the removal effect increased with increasing magnetic field strength. The maximum removal rates for Escherichia coli (E. coli) and Staphylococcus aureus (S. aureus) were 4016.1% and 9675.3% higher, respectively, than without the magnetic field. In addition, the superoxide dismutase (SOD) activity of the microbes decreased by 32.2% when the magnetic field strength was 15.4 mT for 72 min. The microstructure of the stainless steel wool was investigated, and the results showed that particle removal by HGMS has common function by the magnetic force of the high-strength, high-gradient magnetic field on weakly magnetic particles in the water, and on the stainless steel wool.
Abstract: Reverse osmosis (RO) membranes have been widely used for desalination to purify water for drinking and other purposes. Although at present most RO membranes have no resistance to chlorine, chlorine-resistant membranes are being developed. Therefore, direct chlorine treatment or chlorine washing will be an option in preventing biofouling on chlorine-resistant membranes. Furthermore, if particle accumulation control is possible by using chlorine washing, expensive pretreatment for particle removal can be removed or simplified. The objective of this study was to determine the effective hypochlorite washing condition required for controlling biofilm formation and inorganic particle accumulation on RO membrane in a continuous flow channel with RO membrane and spacer. In this study, direct chlorine washing was done by soaking fouled RO membranes in hypochlorite solution and fluorescence intensity was used to quantify biofilm on the membrane surface. After 48 h of soaking the membranes in high fouling potential waters, the fluorescence intensity decreased to 0 from 470 using the following washing conditions: 10 mg/L chlorine concentration, 2 times/d washing interval, and 30 min washing time. The chlorine concentration required to control biofilm formation decreased as the chlorine concentration (0.5–10 mg/L), the washing interval (1–4 times/d), or the washing time (1–30 min) increased. For the sample solutions used in the study, 10 mg/L chlorine concentration with 2 times/d interval, and 5 min washing time was required for biofilm control. The optimum chlorine washing conditions obtained from soaking experiments proved to be applicable also in controlling biofilm formation in continuous flow experiments. Moreover, chlorine washing employed in controlling biofilm with suspended particles resulted in lower amounts of organic (0.03 mg/cm2) and inorganic (0.14 mg/cm2) deposits on the membrane than that for sample water without chlorine washing (0.14 mg/cm2 and 0.33 mg/cm2, respectively). The amount of biofilm formed was 79% controlled by continuous washing with 10 mg/L of free chlorine concentration, and the inorganic accumulation amount decreased by 58% to levels similar to that of pure water with kaolin (0.17 mg/cm2) as feed water. These results confirmed the acceleration of particle accumulation due to biofilm formation, and that the inhibition of biofilm growth can almost completely reduce further particle accumulation. In addition, effective hypochlorite washing condition which can control both biofilm formation and particle accumulation could be achieved.
Abstract: This study investigates the cleaning performance of
high intensity 360 kHz frequency on removal of nano-dimensional
and sub-micron particles from various surfaces, uniformity of the
cleaning tank and run to run variation of cleaning process. The
uniformity of the cleaning tank was measured by two different
methods i.e. 1. ppbTM meter and 2. Liquid Particle Counting (LPC)
technique. The result indicates that the energy was distributed more
uniformly throughout the entire cleaning vessel even at the corners
and edges of the tank when megasonic sweeping technology is
applied. The result also shows that rinsing the parts with 360 kHz
frequency at final rinse gives lower particle counts, hence higher
cleaning efficiency as compared to other frequencies. When
megasonic sweeping technology is applied each piezoelectric
transducers will operate at their optimum resonant frequency and
generates stronger acoustic cavitational force and higher acoustic
streaming velocity. These combined forces are helping to enhance the
particle removal and at the same time improve the overall cleaning
performance. The multiple extractions study was also carried out for
various frequencies to measure the cleaning potential and asymptote
value.
Abstract: Shrunken patterning for integrated device
manufacturing requires surface cleanliness and surface smoothness in
wet chemical processing [1]. It is necessary to control all process
parameters perfectly especially for the common cleaning technique
RCA clean (SC-1 and SC-2) [2]. In this paper the characteristic and
effect of surface preparation parameters are discussed. The properties
of RCA wet chemical processing in silicon technology is based on
processing time, temperature, concentration and megasonic power of
SC-1 and QDR. An improvement of wafer surface preparation by
the enhanced variables of the wet cleaning chemical process is
proposed.
Abstract: A new multi inner stage (MIS) cyclone was designed to
remove the acidic gas and fine particles produced from electronic
industry. To characterize gas flow in MIS cyclone, pressure and
velocity distribution were calculated by means of CFD program. Also,
the flow locus of fine particles and particle removal efficiency were
analyzed by Lagrangian method. When outlet pressure condition was
–100mmAq, the efficiency was the best in this study.