Abstract: Thin ZnO films are deposited on glass substrates via
sol–gel method and dip-coating. The films are prepared from zinc
acetate dehydrate as a starting reagent. After that the as-prepared
ZnO sol is aged for different periods (0, 1, 3, 5, 10, 15 and 30 days).
Nanocrystalline thin films are deposited from various sols. The
effect ZnO sols aging time on the structural and photocatalytic
properties of the films is studied. The films surface is studied by
Scanning Electron Microscopy. The effect of the aging time of the
starting solution is studied in the photocatalytic degradation of
Reactive Black 5 (RB5) by UV-vis spectroscopy. The experiments
are conducted upon UV-light illumination and in complete darkness.
The variation of the absorption spectra shows the degradation of RB5
dissolved in water, as a result of the reaction, occurring on the surface
of the films and promoted by UV irradiation. The initial
concentrations of dye (5, 10 and 20 ppm) and the effect of the aging
time are varied during the experiments. The results show, that the
increasing aging time of starting solution with respect to ZnO
generally promotes photocatalytic activity. The thin films obtained
from ZnO sol, which is aged 30 days have best photocatalytic
degradation of the dye (97,22%) in comparison with the freshly
prepared ones (65,92%). The samples and photocatalytic
experimental results are reproducible. Nevertheless, all films exhibit
a substantial activity in both UV light and darkness, which is
promising for the development of new ZnO photocatalysts by sol-gel
method.
Abstract: In this paper, Zinc Oxide (ZnO) thin films are deposited on glass substrate by sol-gel method. The ZnO thin films with well defined orientation were acquired by spin coating of zinc acetate dehydrate monoethanolamine (MEA), de-ionized water and isopropanol alcohol. These films were pre-heated at 275°C for 10 min and then annealed at 350°C, 450°C and 550°C for 80 min. The effect of annealing temperature and different thickness on structure and surface morphology of the thin films were verified by Atomic Force Microscopy (AFM). It was found that there was a significant effect of annealing temperature on the structural parameters of the films such as roughness exponent, fractal dimension and interface width. Thin films also were characterizied by X-ray Diffractometery (XRD) method. XRD analysis revealed that the annealed ZnO thin films consist of single phase ZnO with wurtzite structure and show the c-axis grain orientation. Increasing annealing temperature increased the crystallite size and the c-axis orientation of the film after 450°C. Also In this study, ZnO thin films in different thickness have been prepared by sol-gel method on the glass substrate at room temperature. The thicknesses of films are 100, 150 and 250 nm. Using fractal analysis, morphological characteristics of surface films thickness in amorphous state were investigated. The results show that with increasing thickness, surface roughness (RMS) and lateral correlation length (ξ) are decreased. Also, the roughness exponent (α) and growth exponent (β) were determined to be 0.74±0.02 and 0.11±0.02, respectively.