Abstract: In this paper we investigate the electrical
characteristics of a new structure of gate all around strained silicon
nanowire field effect transistors (FETs) with dual dielectrics by
changing the radius (RSiGe) of silicon-germanium (SiGe) wire and
gate dielectric. Indeed the effect of high-κ dielectric on Field Induced
Barrier Lowering (FIBL) has been studied. Due to the higher electron
mobility in tensile strained silicon, the n-type FETs with strained
silicon channel have better drain current compare with the pure Si
one. In this structure gate dielectric divided in two parts, we have
used high-κ dielectric near the source and low-κ dielectric near the
drain to reduce the short channel effects. By this structure short
channel effects such as FIBL will be reduced indeed by increasing
the RSiGe, ID-VD characteristics will be improved. The leakage
current and transfer characteristics, the threshold-voltage (Vt), the
drain induced barrier height lowering (DIBL), are estimated with
respect to, gate bias (VG), RSiGe and different gate dielectrics. For
short channel effects, such as DIBL, gate all around strained silicon
nanowire FET have similar characteristics with the pure Si one while
dual dielectrics can improve short channel effects in this structure.
Abstract: This paper presents the design of a ring-shaped tri-axial fore sensor that can be incorporated into the tip of a guidewire for use in minimally invasive surgery (MIS). The designed sensor comprises a ring-shaped structure located at the center of four cantilever beams. The ringdesign allows surgical tools to be easily passed through which largely simplified the integration process. Silicon nanowires (SiNWs) are used aspiezoresistive sensing elementsembeddedon the four cantilevers of the sensor to detect the resistance change caused by the applied load.An integration scheme with new designed guidewire tip structure having two coils at the distal end is presented. Finite element modeling has been employed in the sensor design to find the maximum stress location in order to put the SiNWs at the high stress regions to obtain maximum output. A maximum applicable force of 5 mN is found from modeling. The interaction mechanism between the designed sensor and a steel wire has been modeled by FEM. A linear relationship between the applied load on the steel wire and the induced stress on the SiNWs were observed.