Abstract: Photo-BJMOSFET (Bipolar Junction Metal-Oxide-
Semiconductor Field Effect Transistor) fabricated on SOI film was proposed. ITO film is adopted in the device as gate electrode to reduce
light absorption. Depletion region but not inversion region is formed
in film by applying gate voltage (but low reverse voltage) to achieve
high photo-to-dark-current ratio. Comparisons of photoelectriccharacteristics
executed among VGK=0V, 0.3V, 0.6V, 0.9V and 1.0V
(reverse voltage VAK is equal to 1.0V for total area of 10×10μm2). The
results indicate that the greatest improvement in photo-to-dark-current
ratio is achieved up to 2.38 at VGK=0.6V. In addition,
photo-BJMOSFET is compatible with CMOS integration due to big
input resistance
Abstract: We propose photo-BJMOSFET (Bipolar Junction Metal-Oxide-Semiconductor Field Effect Transistor) fabricated on SOI film. ITO film is adopted in the device as gate electrode to reduce light absorption. I-V characteristics of photo-BJMOSFET obtained in dark (dark current) and under 570nm illumination (photo current) are studied furthermore to achieve high photo-to-dark-current contrast ratio. Two variables in the calculation were the channel length and the thickness of the film which were set equal to six different values, i.e., L=2, 4, 6, 8, 10, and 12μm and three different values, i.e., dsi =100, 200 and 300nm, respectively. The results indicate that the greatest photo-to-dark-current contrast ratio is achieved with L=10μm and dsi=200 nm at VGK=0.6V.