Abstract: Many applications require surface modification and
micro-structuring of polymers. For these purposes is mainly used
ultraviolet (UV) radiation from excimer lamps or excimer lasers.
However, these sources have a decided disadvantage - degrading the
polymer deep inside due to relatively big radiation penetration depth
which may exceed 100 μm. In contrast, extreme ultraviolet (EUV)
radiation is absorbed in a layer approximately 100 nm thick only. In
this work, the radiation from a discharge-plasma EUV source (with
wavelength 46.9 nm) based on a capillary discharge driver is focused
with a spherical Si/Sc multilayer mirror for surface modification of
PMMA sample or thin gold layer (thickness about 40 nm). It was
found that the focused EUV laser beam is capable by one shot to
ablate PMMA or layer of gold, even if the focus is significantly
influenced by astigmatism.