Abstract: TiO2 thin films have been prepared by the sol-gel dipcoating
technique in order to elaborate antireflective thin films for
monocrystalline silicon (mono-Si). The titanium isopropoxyde was
chosen as a precursor with hydrochloric acid as a catalyser for
preparing a stable solution. The optical properties have been tailored
with varying the solution concentration, the withdrawn speed, and the
heat-treatment. We showed that using a TiO2 single layer with 64.5
nm in thickness, heat-treated at 450°C or 300°C reduces the mono-Si
reflection at a level lower than 3% over the broadband spectral
domains [669-834] nm and [786-1006] nm respectively. Those latter
performances are similar to the ones obtained with double layers of
low and high refractive index glasses respectively.
Abstract: The purpose of this work is measurement of the
system presampling MTF of a variable resolution x-ray (VRX) CT
scanner. In this paper, we used the parameters of an actual VRX CT
scanner for simulation and study of effect of different focal spot sizes
on system presampling MTF by Monte Carlo method (GATE
simulation software). Focal spot size of 0.6 mm limited the spatial
resolution of the system to 5.5 cy/mm at incident angles of below 17º
for cell#1. By focal spot size of 0.3 mm the spatial resolution
increased up to 11 cy/mm and the limiting effect of focal spot size
appeared at incident angles of below 9º. The focal spot size of 0.3
mm could improve the spatial resolution to some extent but because
of magnification non-uniformity, there is a 10 cy/mm difference
between spatial resolution of cell#1 and cell#256. The focal spot size
of 0.1 mm acted as an ideal point source for this system. The spatial
resolution increased to more than 35 cy/mm and at all incident angles
the spatial resolution was a function of incident angle. By the way
focal spot size of 0.1 mm minimized the effect of magnification nonuniformity.