Selective Wet-Etching of Amorphous/Crystallized Sb20se80 Thin Films
The selective wet-etching of amorphous and
crystalline region of Sb20Se80 thin films was carried out using organic
based solution e.g. amines. We report the development of an in situ
real-time method to study the wet chemical etching process of thin
films. Characterization of the structure and surface of films studied
by X-ray diffraction, SEM and EBSD methods has been done and
potential application suggested.
@article{"International Journal of Engineering, Mathematical and Physical Sciences:51348", author = "O. Shiman and V. Gerbreders and E. Sledevskis and A. Bulanovs and V.Pashkevich", title = "Selective Wet-Etching of Amorphous/Crystallized Sb20se80 Thin Films", abstract = "The selective wet-etching of amorphous and
crystalline region of Sb20Se80 thin films was carried out using organic
based solution e.g. amines. We report the development of an in situ
real-time method to study the wet chemical etching process of thin
films. Characterization of the structure and surface of films studied
by X-ray diffraction, SEM and EBSD methods has been done and
potential application suggested.", keywords = "amorphous and crystalline phases, chalcogenide thinfilm, etching process", volume = "5", number = "3", pages = "282-4", }