Oxygen-Interstitials and Group-V Element Doping for p-Type ZnO
In realizing devices using ZnO, a key challenge is the
production of p-type material. Substitution of oxygen by a group-V
impurity is thought to result in deep acceptor levels, but a candidate
made up from a complex of a group-V impurity (P, As, Sb) on a Zn
site coupled with two vacant Zn sites is widely viewed as a candidate.
We show using density-functional simulations that in contrast to such
a view, complexes involving oxygen interstitials are energetically
more favorable, resulting in group-V impurities coordinated with four,
five or six oxygen atoms.
@article{"International Journal of Engineering, Mathematical and Physical Sciences:59974", author = "A. M. Gsiea and J. P. Goss and P. R. Briddon and K. M. Etmimi", title = "Oxygen-Interstitials and Group-V Element Doping for p-Type ZnO", abstract = "In realizing devices using ZnO, a key challenge is the
production of p-type material. Substitution of oxygen by a group-V
impurity is thought to result in deep acceptor levels, but a candidate
made up from a complex of a group-V impurity (P, As, Sb) on a Zn
site coupled with two vacant Zn sites is widely viewed as a candidate.
We show using density-functional simulations that in contrast to such
a view, complexes involving oxygen interstitials are energetically
more favorable, resulting in group-V impurities coordinated with four,
five or six oxygen atoms.", keywords = "DFT, Oxygen, p-Type, ZnO.", volume = "7", number = "3", pages = "379-9", }