Vertical Micromirror Fabrication by X-ray Lithography for Single Mode Optical Fiber Switching Applications

Inthis paper, design and fabrication of vertical micromirror for optical switching applications of single mode optical fibers are proposed. The structure of micromirror will be created from negative photoresist (SU-8) on X-ray lithography using X-ray from synchrotron light source. The properties of X-ray from synchrotron light source are high-energy electrons which can construct materials that have a high aspect ratio. In addition, the technique of gold coating of reflective material has been used for change direction of light between two pairs of optical fibers. At a wavelength of 1310 nm with minimum average loss of 5.305 dB is obtained.

Authors:

• R. Chimchang
• R. Tongta
• R. Phatthanakun

Keywords:

• vertical micromirror
• negative photoresist
• X-ray lithography

References:

[1] C. Marxer, C. Thio, M.-A. Grétillat, N. F. de Rooij, R. Batting, O.
Anthamatten, B. Valk, and P. Vogel. "Vertical Mirrors Fabricated by
Deep Reactive Ion Etching for Fiber-Optic Switching Applications",
Journal of Microelectromechanical Systems, vol.6, no.3, pp. 277-285,
Sep. 2003.
[2] O.V. Makarova, R. Divan, J. Tucek, K. Kreischer, P.T. Amstutz, D.C.
Mancini, C.-M. Tang. "Fabrication of Solid Copper 220 GHz Folded
Waveguide Circuits by UV Lithography", 2010 IEEE International
Vacuum Electronics Conference (IVEC), pp. 183-184, 2010.
[3] R. Phatthanakun, M. Mapato, W. Wanburee, S. Promwikorn, N.
Chathirat, P. Songsiriritthigul, P. Klysubun and N. Chomnawang.
"Copier Transparency as a Transparent Support for X-ray Mask
Absorber." International Conference on Materials for Advanced
Technologies - ICMAT, Singapore, July 1-7, 2007.