Deposition Rate and Energy Enhancements of TiN Thin-Film in a Magnetized Sheet Plasma Source
Titanium nitride (TiN) has been synthesized using the
sheet plasma negative ion source (SPNIS). The parameters used for
its effective synthesis has been determined from previous
experiments and studies. In this study, further enhancement of the
deposition rate of TiN synthesis and advancement of the SPNIS
operation is presented. This is primarily achieved by the addition of
Sm-Co permanent magnets and a modification of the configuration in
the TiN deposition process. The magnetic enhancement is aimed at
optimizing the sputtering rate and the sputtering yield of the process.
The Sm-Co permanent magnets are placed below the Ti target for
better sputtering by argon. The Ti target is biased from –250V to –
350V and is sputtered by Ar plasma produced at discharge current of
2.5–4A and discharge potential of 60–90V. Steel substrates of
dimensions 20x20x0.5mm3 were prepared with N2:Ar volumetric
ratios of 1:3, 1:5 and 1:10. Ocular inspection of samples exhibit
bright gold color associated with TiN. XRD characterization
confirmed the effective TiN synthesis as all samples exhibit the (200)
and (311) peaks of TiN and the non-stoichiometric Ti2N (220) facet.
Cross-sectional SEM results showed increase in the TiN deposition
rate of up to 0.35μm/min. This doubles what was previously obtained
[1]. Scanning electron micrograph results give a comparative
morphological picture of the samples. Vickers hardness results gave
the largest hardness value of 21.094GPa.
[1] V. R. Noguera and H. J. Ramos, "A magnetized sheet plasma source for
the synthesis of TiN on stainless steel substrates." Thin Solid Films 613,
2006, pp. 506-507.
[2] M. Guemmaz, A. Masser, and J. Grob, "Ion implantation processing of
sub-stoichiometric titanium nitrides and carbonitrides: chemical
structural andmicromechanical investigations." Applied Physics A 64,
1997, pp. 407-415.
[3] R. Bahl, A. Kumar, M. Vedawyas, and D. Patel, "Synthesis and
characterization of TiC and TiCN coatings." Applied Physics A [Suppl.],
1999, S643-S646.
[4] H. Ramos, and R. Awayan, R. "Nitride formation using a magnetized
sheet plasma source." Vacuum 65, 2002, 397-402.
[5] S. Fortuna, Y. Sharkeev, A. Perry, J. Matossian, and I.
Shulepov,"Microstructural features of wear resistant titanium nitride
coatings deposited by different methods." Thin Solid Films 377-378,
2000, 512-517.
[6] J.H. Hsieh, and C. Li, "Calculation of sputtering rate by a Monte
Carlomethod." Journal of Materials Science Letters 22, 2003, 1125-
1126.
[7] N. Matsunami, Y. Yamamura, Y. Itikawa, N. Itoh, Y. Kazumata, S.
Miyagawa, K. Morita, and R. Shimizu, "Energy dependence of
sputtering yields of monoatomic solids." Institute of Plasma Physics
Journal -AM 14, 1980, 1-15.
[1] V. R. Noguera and H. J. Ramos, "A magnetized sheet plasma source for
the synthesis of TiN on stainless steel substrates." Thin Solid Films 613,
2006, pp. 506-507.
[2] M. Guemmaz, A. Masser, and J. Grob, "Ion implantation processing of
sub-stoichiometric titanium nitrides and carbonitrides: chemical
structural andmicromechanical investigations." Applied Physics A 64,
1997, pp. 407-415.
[3] R. Bahl, A. Kumar, M. Vedawyas, and D. Patel, "Synthesis and
characterization of TiC and TiCN coatings." Applied Physics A [Suppl.],
1999, S643-S646.
[4] H. Ramos, and R. Awayan, R. "Nitride formation using a magnetized
sheet plasma source." Vacuum 65, 2002, 397-402.
[5] S. Fortuna, Y. Sharkeev, A. Perry, J. Matossian, and I.
Shulepov,"Microstructural features of wear resistant titanium nitride
coatings deposited by different methods." Thin Solid Films 377-378,
2000, 512-517.
[6] J.H. Hsieh, and C. Li, "Calculation of sputtering rate by a Monte
Carlomethod." Journal of Materials Science Letters 22, 2003, 1125-
1126.
[7] N. Matsunami, Y. Yamamura, Y. Itikawa, N. Itoh, Y. Kazumata, S.
Miyagawa, K. Morita, and R. Shimizu, "Energy dependence of
sputtering yields of monoatomic solids." Institute of Plasma Physics
Journal -AM 14, 1980, 1-15.
@article{"International Journal of Chemical, Materials and Biomolecular Sciences:55075", author = "Hamdi Muhyuddin D. Barra and Henry J. Ramos", title = "Deposition Rate and Energy Enhancements of TiN Thin-Film in a Magnetized Sheet Plasma Source", abstract = "Titanium nitride (TiN) has been synthesized using the
sheet plasma negative ion source (SPNIS). The parameters used for
its effective synthesis has been determined from previous
experiments and studies. In this study, further enhancement of the
deposition rate of TiN synthesis and advancement of the SPNIS
operation is presented. This is primarily achieved by the addition of
Sm-Co permanent magnets and a modification of the configuration in
the TiN deposition process. The magnetic enhancement is aimed at
optimizing the sputtering rate and the sputtering yield of the process.
The Sm-Co permanent magnets are placed below the Ti target for
better sputtering by argon. The Ti target is biased from –250V to –
350V and is sputtered by Ar plasma produced at discharge current of
2.5–4A and discharge potential of 60–90V. Steel substrates of
dimensions 20x20x0.5mm3 were prepared with N2:Ar volumetric
ratios of 1:3, 1:5 and 1:10. Ocular inspection of samples exhibit
bright gold color associated with TiN. XRD characterization
confirmed the effective TiN synthesis as all samples exhibit the (200)
and (311) peaks of TiN and the non-stoichiometric Ti2N (220) facet.
Cross-sectional SEM results showed increase in the TiN deposition
rate of up to 0.35μm/min. This doubles what was previously obtained
[1]. Scanning electron micrograph results give a comparative
morphological picture of the samples. Vickers hardness results gave
the largest hardness value of 21.094GPa.", keywords = "Chemical vapor deposition, Magnetized sheetplasma, Thin-film synthesis, Titanium nitride.", volume = "5", number = "2", pages = "149-3", }