Abstract: The absolute Cu atoms density in Cu(2S1/22P1/2)
ground state has been measured by Resonance Optical Absorption
(ROA) technique in a DC magnetron sputtering deposition with
argon. We measured these densities under variety of operation
conditions: pressure from 0.6 μbar to 14 μbar, input power from
10W to 200W and N2 mixture from 0% to 100%. For measuring the
gas temperature, we used the simulation of N2 rotational spectra
with a special computer code. The absolute number density of Cu
atoms decreases with increasing the N2 percentage of buffer gas at
any conditions of this work. But the deposition rate, is not decreased
with the same manner. The deposition rate variation is very small
and in the limit of quartz balance measuring equipment accuracy. So
we conclude that decrease in the absolute number density of Cu
atoms in magnetron plasma has not a big effect on deposition rate,
because the diffusion of Cu atoms to the chamber volume and
deviation of Cu atoms from direct path (towards the substrate)
decreases with increasing of N2 percentage of buffer gas. This is
because of the lower mass of N2 atoms compared to the argon ones.
Abstract: Indium-tin oxide films are deposited by low plasma
temperature RF sputtering on highly flexible modification of glycol
polyethyleneterephtalate substrates. The produced layers are
characterized with transparency over 82 % and sheet resistance of
86.9 Ω/square. The film’s conductivity was further improved by
additional UV illumination from light source (365 nm), having power
of 250 W. The influence of the UV exposure dose on the structural
and electro-optical properties of ITO was investigated. It was
established that the optimum time of illumination is 10 minutes and
further UV treatment leads to polymer substrates degradation.
Structural and bonds type analysis show that at longer treatment
carbon atoms release and diffuse into ITO films, which worsen their
electrical behavior. For the optimum UV dose the minimum sheet
resistance was measured to be 19.2 Ω/square, and the maximum
transparency remained almost unchanged – above 82 %.
Abstract: The control of oxygen flow rate during growth of
titanium dioxide by mass flow controller in DC plasma sputtering
growth system is studied. The impedance of TiO2 films for inductance
effect is influenced by annealing time and oxygen flow rate. As
annealing time is increased, the inductance of TiO2 film is the more.
The growth condition of optimum and maximum inductance for TiO2
film to serve as sensing device are oxygen flow rate of 15 sccm and
large annealing time. The large inductance of TiO2 film will be
adopted to fabricate the biosensor to obtain the high sensitivity of
sensing in biology.
Abstract: Optical properties of sputter-deposited ZnS thin films
were investigated as potential replacements for CBD(chemical bath
deposition) CdS buffer layers in the application of CIGS solar cells.
ZnS thin films were fabricated on glass substrates at RT, 150oC, 200oC,
and 250oC with 50 sccm Ar gas using an RF magnetron sputtering
system. The crystal structure of the thin film is found to be zinc blende
(cubic) structure. Lattice parameter of ZnS is slightly larger than CdS
on the plane and thus better matched with that of CIGS. Within a
400-800 nm wavelength region, the average transmittance was larger
than 75%. When the deposition temperature of the thin film was
increased, the blue shift phenomenon was enhanced. Band gap energy
of the ZnS thin film tended to increase as the deposition temperature
increased. ZnS thin film is a promising material system for the CIGS
buffer layer, in terms of ease of processing, low cost, environmental
friendliness, higher transparency, and electrical properties
Abstract: Titanium nitride (TiN) has been synthesized using the
sheet plasma negative ion source (SPNIS). The parameters used for
its effective synthesis has been determined from previous
experiments and studies. In this study, further enhancement of the
deposition rate of TiN synthesis and advancement of the SPNIS
operation is presented. This is primarily achieved by the addition of
Sm-Co permanent magnets and a modification of the configuration in
the TiN deposition process. The magnetic enhancement is aimed at
optimizing the sputtering rate and the sputtering yield of the process.
The Sm-Co permanent magnets are placed below the Ti target for
better sputtering by argon. The Ti target is biased from –250V to –
350V and is sputtered by Ar plasma produced at discharge current of
2.5–4A and discharge potential of 60–90V. Steel substrates of
dimensions 20x20x0.5mm3 were prepared with N2:Ar volumetric
ratios of 1:3, 1:5 and 1:10. Ocular inspection of samples exhibit
bright gold color associated with TiN. XRD characterization
confirmed the effective TiN synthesis as all samples exhibit the (200)
and (311) peaks of TiN and the non-stoichiometric Ti2N (220) facet.
Cross-sectional SEM results showed increase in the TiN deposition
rate of up to 0.35μm/min. This doubles what was previously obtained
[1]. Scanning electron micrograph results give a comparative
morphological picture of the samples. Vickers hardness results gave
the largest hardness value of 21.094GPa.
Abstract: Silver nano-particles have been used for antibacterial
purpose and it is also believed to have removal of odorous compounds,
oxidation capacity as a metal catalyst. In this study, silver
nano-particles in nano sizes (5-30 nm) were prepared on the surface of
NaHCO3, the supporting material, using a sputtering method that
provided high silver content and minimized conglomerating problems
observed in the common AgNO3 photo-deposition method. The silver
nano-particles were dispersed by dissolving Ag-NaHCO3 into water,
and the dispersed silver nano-particles in the aqueous phase were
applied to remove inorganic odor compounds, H2S, in a scrubbing
reactor. Hydrogen sulfide in the gas phase was rapidly removed by the
silver nano-particles, and the concentration of sulfate (SO4
2-) ion
increased with time due to the oxidation reaction by silver as a
catalyst. Consequently, the experimental results demonstrated that the
silver nano-particles in the aqueous solution can be successfully
applied to remove odorous compounds without adding additional
energy sources and producing any harmful byproducts
Abstract: Resistance spot welding process comprises of electric,
thermal and mechanical phenomenon, which makes this process
complex and highly non-linear and thus, it becomes difficult to model
it. In order to obtain good weld nugget during spot welding, hit and
trial welds are usually done which is very costly. Therefore the
numerical simulation research has been conducted to understand the
whole process. In this paper three different cases were analyzed by
varying the tip contact area and it was observed that, with the
variation of tip contact area the nugget formation at the faying
surface is affected. The tip contact area of the welding electrode
becomes large with long welding cycles. Therefore in order to
maintain consistency of nugget formation during the welding process,
the current compensation in control feedback is required. If the
contact area of the welding electrode tip is reduced, a large amount of
current flows through the faying surface, as a result of which
sputtering occurs.
Abstract: A diamond-like carbon (DLC) based solid-lubricant
film was designed and DLC films were successfully prepared using a
microwave plasma enhanced magnetron sputtering deposition
technology. Post-test characterizations including Raman
spectrometry, X-ray diffraction, nano-indentation test, adhesion test,
friction coefficient test were performed to study the influence of
substrate bias voltage on the mechanical properties of the W- and
S-doped DLC films. The results indicated that the W- and S-doped
DLC films also had the typical structure of DLC films and a better
mechanical performance achieved by the application of a substrate
bias of -200V.
Abstract: In this investigation, anatase TiO2 thin films were
grown by radio frequency magnetron sputtering on glass substrates at
a high sputtering pressure and room temperature. The anatase films
were then annealed at 300-600 °C in air for a period of 1 hour. To
examine the structure and morphology of the films, X-ray diffraction
(XRD) and atomic force microscopy (AFM) methods were used
respectively. From X-ray diffraction patterns of the TiO2 films, it was
found that the as-deposited film showed some differences compared
with the annealed films and the intensities of the peaks of the
crystalline phase increased with the increase of annealing
temperature. From AFM images, the distinct variations in the
morphology of the thin films were also observed. The optical
constants were characterized using the transmission spectra of the
films obtained by UV-VIS-IR spectrophotometer. Besides, optical
thickness of the film deposited at room temperature was calculated
and cross-checked by taking a cross-sectional image through SEM.
The optical band gaps were evaluated through Tauc model. It was
observed that TiO2 films produced at room temperatures exhibited
high visible transmittance and transmittance decreased slightly with
the increase of annealing temperatures. The films were found to be
crystalline having anatase phase. The refractive index of the films
was found from 2.31-2.35 in the visible range. The extinction
coefficient was nearly zero in the visible range and was found to
increase with annealing temperature. The allowed indirect optical
band gap of the films was estimated to be in the range from 3.39 to
3.42 eV which showed a small variation. The allowed direct band
gap was found to increase from 3.67 to 3.72 eV. The porosity was
also found to decrease at a higher annealing temperature making the
film compact and dense.
Abstract: Sputter deposition processes, especially for sputtering
from metal targets, are well investigated. For practical reasons, i.e.
for industrial processes, energetic considerations for sputter
deposition are useful in order to optimize the sputtering process. In
particular, for substrates at floating conditions it is required to obtain
energetic conditions during film growth that enables sufficient dense
metal films of good quality. The influence of ion energies, energy
density and momentum transfer is thus examined both for sputtering
at the target as well as during film growth. Different regimes
dominated by ion energy, energy density and momentum transfer
were identified by using different plasma sources and by varying
power input, pressure and bias voltage.
Abstract: In this paper, we proposed the effects of Mo thickness
on the properties of AZO/Mo/AZO multilayer thin films for
opto-electronics applications. The structural, optical and electrical
properties of AZO/Mo/AZO thin films were investigated.
Optimization of the thin films coatings resulted with low resistivity of
9.98 × 10-5 )-cm, mobility of 12.75 cm2/V-s, carrier concentration of
1.05 × 1022 cm-3, maximum transmittance of 79.13% over visible
spectrum of 380 – 780 nm and Haacke figure of merit (FOM) are 5.95
× 10-2 )-1 under Mo layer thickness of 15 nm. These results indicate an
alternative candidate for use as a transparent electrode in solar cells
and various displays applications.
Abstract: ZnO+Ga2O3 functionally graded thin films (FGTFs)
were examined for their potential use as Solar cell and organic light
emitting diodes (OLEDs). FGTF transparent conducting oxides (TCO)
were fabricated by combinatorial RF magnetron sputtering. The
composition gradient was controlled up to 10% by changing the
plasma power of the two sputter guns. A Ga2O3+ZnO graded region
was placed on the top layer of ZnO. The FGTFs showed up to 80%
transmittance. Their surface resistances were reduced to < 10% by
increasing the Ga2O3: pure ZnO ratio in the TCO. The FGTFs- work
functions could be controlled within a range of 0.18 eV. The
controlled work function is a very promising technology because it
reduces the contact resistance between the anode and Hall transport
layers of OLED and solar cell devices.
Abstract: The morphological parameter of a thin film surface
can be characterized by power spectral density (PSD) functions
which provides a better description to the topography than the RMS
roughness and imparts several useful information of the surface
including fractal and superstructure contributions. Through the
present study Nanoparticle copper/carbon composite films were
prepared by co-deposition of RF-Sputtering and RF-PECVD method
from acetylene gas and copper target. Surface morphology of thin
films is characterized by using atomic force microscopy (AFM). The
Carbon content of our films was obtained by Rutherford Back
Scattering (RBS) and it varied from .4% to 78%. The power values of
power spectral density (PSD) for the AFM data were determined by
the fast Fourier transform (FFT) algorithms. We investigate the effect
of carbon on the roughness of thin films surface. Using such
information, roughness contributions of the surface have been
successfully extracted.