Abstract: Reverse osmosis (RO) membranes have been widely used for desalination to purify water for drinking and other purposes. Although at present most RO membranes have no resistance to chlorine, chlorine-resistant membranes are being developed. Therefore, direct chlorine treatment or chlorine washing will be an option in preventing biofouling on chlorine-resistant membranes. Furthermore, if particle accumulation control is possible by using chlorine washing, expensive pretreatment for particle removal can be removed or simplified. The objective of this study was to determine the effective hypochlorite washing condition required for controlling biofilm formation and inorganic particle accumulation on RO membrane in a continuous flow channel with RO membrane and spacer. In this study, direct chlorine washing was done by soaking fouled RO membranes in hypochlorite solution and fluorescence intensity was used to quantify biofilm on the membrane surface. After 48 h of soaking the membranes in high fouling potential waters, the fluorescence intensity decreased to 0 from 470 using the following washing conditions: 10 mg/L chlorine concentration, 2 times/d washing interval, and 30 min washing time. The chlorine concentration required to control biofilm formation decreased as the chlorine concentration (0.5–10 mg/L), the washing interval (1–4 times/d), or the washing time (1–30 min) increased. For the sample solutions used in the study, 10 mg/L chlorine concentration with 2 times/d interval, and 5 min washing time was required for biofilm control. The optimum chlorine washing conditions obtained from soaking experiments proved to be applicable also in controlling biofilm formation in continuous flow experiments. Moreover, chlorine washing employed in controlling biofilm with suspended particles resulted in lower amounts of organic (0.03 mg/cm2) and inorganic (0.14 mg/cm2) deposits on the membrane than that for sample water without chlorine washing (0.14 mg/cm2 and 0.33 mg/cm2, respectively). The amount of biofilm formed was 79% controlled by continuous washing with 10 mg/L of free chlorine concentration, and the inorganic accumulation amount decreased by 58% to levels similar to that of pure water with kaolin (0.17 mg/cm2) as feed water. These results confirmed the acceleration of particle accumulation due to biofilm formation, and that the inhibition of biofilm growth can almost completely reduce further particle accumulation. In addition, effective hypochlorite washing condition which can control both biofilm formation and particle accumulation could be achieved.
Abstract: The iron environment in Fe-doped Vycor Anode was
investigated with EXAFS using Brookhaven Synchrotron Light
Source. The iron-reducing Shewanella oneidensis culture was grown
in a microbial fuel cell under anaerobic respiration. The Fe bond
length was found to decrease and correlate with the amount of
biofilm growth on the Fe-doped Vycor Anode. The data suggests that
Fe-doped Vycor Anode would be a good substrate to study the
Shewanella oneidensis nanowire structure using EXAFS.
Abstract: Air emissions from waste treatment plants often
consist of a combination of Volatile Organic Compounds (VOCs)
and odors. Hydrogen sulfide is one of the major odorous gases
present in the waste emissions coming from municipal wastewater
treatment facilities. Hydrogen sulfide (H2S) is odorous, highly toxic
and flammable. Exposure to lower concentrations can result in eye
irritation, a sore throat and cough, shortness of breath, and fluid in
the lungs. Biofiltration has become a widely accepted technology for
treating air streams containing H2S. When compared with other nonbiological
technologies, biofilter is more cost-effective for treating large
volumes of air containing low concentrations of biodegradable compounds.
Optimization of biofilter media is essential for many reasons such as:
providing a higher surface area for biofilm growth, low pressure drop,
physical stability, and good moisture retention. In this work, a novel
biofilter media is developed and tested at a pumping station of a
municipality located in the United Arab Emirates (UAE). The
media is found to be very effective (>99%) in removing H2S
concentrations that are expected in pumping stations under steady
state and shock loading conditions.
Abstract: Sputter deposition processes, especially for sputtering
from metal targets, are well investigated. For practical reasons, i.e.
for industrial processes, energetic considerations for sputter
deposition are useful in order to optimize the sputtering process. In
particular, for substrates at floating conditions it is required to obtain
energetic conditions during film growth that enables sufficient dense
metal films of good quality. The influence of ion energies, energy
density and momentum transfer is thus examined both for sputtering
at the target as well as during film growth. Different regimes
dominated by ion energy, energy density and momentum transfer
were identified by using different plasma sources and by varying
power input, pressure and bias voltage.