Abstract: Indium-tin oxide films are deposited by low plasma
temperature RF sputtering on highly flexible modification of glycol
polyethyleneterephtalate substrates. The produced layers are
characterized with transparency over 82 % and sheet resistance of
86.9 Ω/square. The film’s conductivity was further improved by
additional UV illumination from light source (365 nm), having power
of 250 W. The influence of the UV exposure dose on the structural
and electro-optical properties of ITO was investigated. It was
established that the optimum time of illumination is 10 minutes and
further UV treatment leads to polymer substrates degradation.
Structural and bonds type analysis show that at longer treatment
carbon atoms release and diffuse into ITO films, which worsen their
electrical behavior. For the optimum UV dose the minimum sheet
resistance was measured to be 19.2 Ω/square, and the maximum
transparency remained almost unchanged – above 82 %.