Effects of Mo Thickness on the Properties of AZO/Mo/AZO Multilayer Thin Films
In this paper, we proposed the effects of Mo thickness
on the properties of AZO/Mo/AZO multilayer thin films for
opto-electronics applications. The structural, optical and electrical
properties of AZO/Mo/AZO thin films were investigated.
Optimization of the thin films coatings resulted with low resistivity of
9.98 × 10-5 )-cm, mobility of 12.75 cm2/V-s, carrier concentration of
1.05 × 1022 cm-3, maximum transmittance of 79.13% over visible
spectrum of 380 – 780 nm and Haacke figure of merit (FOM) are 5.95
× 10-2 )-1 under Mo layer thickness of 15 nm. These results indicate an
alternative candidate for use as a transparent electrode in solar cells
and various displays applications.
[1] G. Golan, A. Axelevitch, B. Gorenstein and A. Peled, "Novel type of
indium oxide thin films sputtering for opto-electronic applications,"
Applied Surface Science, vol.253, pp.6608-6611, 2007.
[2] Betz U, Kharrazi, Olsson M, Marthy J, Escola M F and Atamny F, " Thin
films engineering of indium tin oxide: Large area flat panel displays
application," Surf. Coat. Technol. , Vol. 200, pp. 5751-5759, 2006.
[3] D. Arai, M. Kondo, A. Matsuda, "Reduction of light-induced defects by
nano-structure tailored silicon solar cells using low-cost TCO substrates,"
Sol. Energ. Mater. Sol. Cell, vol. 90, pp. 3174-3178, 2006.
[4] T. Hino,Y. Ogawa and N. Kuramoto, "Preparation of functionalized and
non-functionalized fullerene thin films on ITO glasses and the application
to a counter electrode in a dye-sensitized," Carbon , vol. 44, pp. 880-887,
2006.
[5] Jin-A Jeong,Yong-Seok Park and Han-Ki Kim, "Comparison of
electrical, optical, structural, and interface properties of IZO/Ag/IZO and
IZO/Au/IZO multilayer electrodes for organic photovoltaics", J. Appl.
Phys. vol. 107, pp. 0233111, 2010.
[6] D.R. Sahu , Shin-Yuan Lin and Jow-Lay Huang, "Investigation of
conductive and transparent Al-doped ZnO/Ag/Al-doped ZnO multilayer
coatings by electron beam evaporation," Thin Solid Films, vol. 516, pp.
4728-4732, 2008.
[7] Y.S. Jung, Y.W. Choi, H.C. Lee, D.W. Lee, "Effects of thermal treatment
on the electrical and optical properties of silver-based indium tin
oxide/metal/indium tin oxide structures," Thin Solid Films, vol. 440, pp.
278-284, 2003.
[8] Y. Aoshima, M. Miyazaki, K. Sato, Y. Akao, S. Takaki, K. Adachi,
"Development of silver-based multilayer coating electrodes with low
resistance for use in flat panel displayers," Jpn. J. Appl. Phys. Vol. 39, pp.
4884-4889, 2000.
[9] E. Ando and M. Miyazaki, "Moisture resistance of the low-emissivity
coatings with a layer structure of Al-doped ZnO/Ag/Al-doped ZnO,"
Thin Solid Films, vol. 392, pp. 289, 2001.
[10] D. R. Sahu and J. L. Huang, "Characteristics of ZnO/Cu/ZnO multilayer
films on copper layer properties," Applied Surface Science, vol. 253, pp.
827-832, 2006.
[11] X. Liu, X. Cai, J. Mao, C. Jin, "ZnS/Ag/ZnS nano-multilayer films for
transparent electrodes in flat display application," Appl. Surf. Sci., vol.
183, pp. 103, 2001.
[12] Jin-A Jeong, Han-Ki Kim., "Low resistance and highly transparent
ITO/Ag/ITO multilayer electrode using surface plasmon resonance of Ag
layer for bulk-heterojunction organic solar cells," Solar Energy Materials
& Solar Cells, vol. 93, pp. 1801-1809, 2009.
[13] S. Sutthana, N. Hongsith, S. Choopun, "AZO/Ag/AZO multilayer films
prepared by DC magnetron sputtering for dye-sensitized solar cell
application," Current Applied Physics, vol. 10, pp. 813-816, 2010.
[14] Y.P. Wang, J.G. Lu, X. Bie, Z.Z. Ye, X. Li, D. Song, X.Y. Zhao, W.Y.
Ye, "Transparent conductive and near-infrared reflective Cu-based
Al-doped ZnO multilayer films grown by magnetron sputtering at room
temperature," Applied Surface Science, vol. 257, pp. 5966-5971, 2011.
[15] M. Fahland, P. Karlsson, C. Charton, "Low resistivity transparent
electrodes for display on polymer substrates," Thin Solid Films, vol. 392,
pp.334-337, 2001.
[16] G. Gordillo, F. Mesa, and C. Calderon, "Electrical and Morphological
Properties of Low Resistivity Mo thin Films Prepared by Magnetron
Sputtering," Brazilian Journal of Physics, vol. 36, pp. 982, 2006.
[17] X.T. Hao, L.W. Tan, K.S. Ong and F. Zhu, "High-performance
low-temperature transparent conducting aluminum doped ZnO thin films
and applications," Journal of Crystal Growth, vol. 287, pp. 44, 2006.
[18] B.D. Cullity, "Elements of X-ray Diffraction, " 2nd ed, Addison-Wesley,
New York, chap.3, pp. 102, 1978.
[19] Hung-Wei Wu, Ru-Yuan Yang, Chin-Min Hsiung, Chien-Hsun Chu,
"Effects of Ar Flow on the Optoelectronic Characteristics of
Aluminum-doped Zinc Oxide (AZO) Thin Films Prepared by RF
Magnetron Sputtering," International Symposium on Computer
Consumer and Control," pp. 309-312, 2012.
[20] [20] M. Suchea, S Christoulakis, N. Katsarakis, T. Kitsopoulos and G.
Kiriakidis, "Comparative study of ZnO and Al-doped ZnO transparent
thin films grown by DC magnetron sputtering", Thin Solid Films, vol.
515, pp. 6562-6566, 2007.
[21] M. Bender, W. Seelig, C. Daube, H. Frankenberger, B. Ocker, and J.
Stollenwerk, "Dependence of oxygen flow on optical and electrical
properties of DC-magnetron sputtered ITO films," Thin Solid Films, vol.
326, pp. 72-77, 1998.
[22] Z.L. Pei, C. Sun, M.H. Tan, J.Q. Xiao, D.H. Guan, R.F. Huang, L.S. Wen,
"Optical and electrical properties of direct-current magnetron sputtered
ZnO:Al films," J. Appl. Phys. Vol. 90, pp. 3432, 2001.
[23] A. Indluru, T.L. Alford, "Effect of Ag thickness on electrical transport
and optical properties of indium tin oxide/Ag/indium tin oxide
multilayers", J. Appl. Phys. vol.105, pp. 123528, 2009.
[24] Park K C, Ma D Y and Kim K H., "The physical properties of Al doped
zinc oxide films prepared by RF magnetron sputtering," Thin Solid Films.
vol. 305, pp. 201-209, 1997.
[25] K. Sivaramakrishnan, N. D. Theodore, J. F. Moulder and T. L. Alford,
"The role of copper in ZnO/Cu/ZnO thin films for flexible electronics," J.
Appl. Phys. vol. 106, pp. 063510, 2009.
[26] G. Haacke, "New figure of merit for transparent conductors", J. Appl.
Phys. vol. 47, pp. 4086-4089, 1976.
[1] G. Golan, A. Axelevitch, B. Gorenstein and A. Peled, "Novel type of
indium oxide thin films sputtering for opto-electronic applications,"
Applied Surface Science, vol.253, pp.6608-6611, 2007.
[2] Betz U, Kharrazi, Olsson M, Marthy J, Escola M F and Atamny F, " Thin
films engineering of indium tin oxide: Large area flat panel displays
application," Surf. Coat. Technol. , Vol. 200, pp. 5751-5759, 2006.
[3] D. Arai, M. Kondo, A. Matsuda, "Reduction of light-induced defects by
nano-structure tailored silicon solar cells using low-cost TCO substrates,"
Sol. Energ. Mater. Sol. Cell, vol. 90, pp. 3174-3178, 2006.
[4] T. Hino,Y. Ogawa and N. Kuramoto, "Preparation of functionalized and
non-functionalized fullerene thin films on ITO glasses and the application
to a counter electrode in a dye-sensitized," Carbon , vol. 44, pp. 880-887,
2006.
[5] Jin-A Jeong,Yong-Seok Park and Han-Ki Kim, "Comparison of
electrical, optical, structural, and interface properties of IZO/Ag/IZO and
IZO/Au/IZO multilayer electrodes for organic photovoltaics", J. Appl.
Phys. vol. 107, pp. 0233111, 2010.
[6] D.R. Sahu , Shin-Yuan Lin and Jow-Lay Huang, "Investigation of
conductive and transparent Al-doped ZnO/Ag/Al-doped ZnO multilayer
coatings by electron beam evaporation," Thin Solid Films, vol. 516, pp.
4728-4732, 2008.
[7] Y.S. Jung, Y.W. Choi, H.C. Lee, D.W. Lee, "Effects of thermal treatment
on the electrical and optical properties of silver-based indium tin
oxide/metal/indium tin oxide structures," Thin Solid Films, vol. 440, pp.
278-284, 2003.
[8] Y. Aoshima, M. Miyazaki, K. Sato, Y. Akao, S. Takaki, K. Adachi,
"Development of silver-based multilayer coating electrodes with low
resistance for use in flat panel displayers," Jpn. J. Appl. Phys. Vol. 39, pp.
4884-4889, 2000.
[9] E. Ando and M. Miyazaki, "Moisture resistance of the low-emissivity
coatings with a layer structure of Al-doped ZnO/Ag/Al-doped ZnO,"
Thin Solid Films, vol. 392, pp. 289, 2001.
[10] D. R. Sahu and J. L. Huang, "Characteristics of ZnO/Cu/ZnO multilayer
films on copper layer properties," Applied Surface Science, vol. 253, pp.
827-832, 2006.
[11] X. Liu, X. Cai, J. Mao, C. Jin, "ZnS/Ag/ZnS nano-multilayer films for
transparent electrodes in flat display application," Appl. Surf. Sci., vol.
183, pp. 103, 2001.
[12] Jin-A Jeong, Han-Ki Kim., "Low resistance and highly transparent
ITO/Ag/ITO multilayer electrode using surface plasmon resonance of Ag
layer for bulk-heterojunction organic solar cells," Solar Energy Materials
& Solar Cells, vol. 93, pp. 1801-1809, 2009.
[13] S. Sutthana, N. Hongsith, S. Choopun, "AZO/Ag/AZO multilayer films
prepared by DC magnetron sputtering for dye-sensitized solar cell
application," Current Applied Physics, vol. 10, pp. 813-816, 2010.
[14] Y.P. Wang, J.G. Lu, X. Bie, Z.Z. Ye, X. Li, D. Song, X.Y. Zhao, W.Y.
Ye, "Transparent conductive and near-infrared reflective Cu-based
Al-doped ZnO multilayer films grown by magnetron sputtering at room
temperature," Applied Surface Science, vol. 257, pp. 5966-5971, 2011.
[15] M. Fahland, P. Karlsson, C. Charton, "Low resistivity transparent
electrodes for display on polymer substrates," Thin Solid Films, vol. 392,
pp.334-337, 2001.
[16] G. Gordillo, F. Mesa, and C. Calderon, "Electrical and Morphological
Properties of Low Resistivity Mo thin Films Prepared by Magnetron
Sputtering," Brazilian Journal of Physics, vol. 36, pp. 982, 2006.
[17] X.T. Hao, L.W. Tan, K.S. Ong and F. Zhu, "High-performance
low-temperature transparent conducting aluminum doped ZnO thin films
and applications," Journal of Crystal Growth, vol. 287, pp. 44, 2006.
[18] B.D. Cullity, "Elements of X-ray Diffraction, " 2nd ed, Addison-Wesley,
New York, chap.3, pp. 102, 1978.
[19] Hung-Wei Wu, Ru-Yuan Yang, Chin-Min Hsiung, Chien-Hsun Chu,
"Effects of Ar Flow on the Optoelectronic Characteristics of
Aluminum-doped Zinc Oxide (AZO) Thin Films Prepared by RF
Magnetron Sputtering," International Symposium on Computer
Consumer and Control," pp. 309-312, 2012.
[20] [20] M. Suchea, S Christoulakis, N. Katsarakis, T. Kitsopoulos and G.
Kiriakidis, "Comparative study of ZnO and Al-doped ZnO transparent
thin films grown by DC magnetron sputtering", Thin Solid Films, vol.
515, pp. 6562-6566, 2007.
[21] M. Bender, W. Seelig, C. Daube, H. Frankenberger, B. Ocker, and J.
Stollenwerk, "Dependence of oxygen flow on optical and electrical
properties of DC-magnetron sputtered ITO films," Thin Solid Films, vol.
326, pp. 72-77, 1998.
[22] Z.L. Pei, C. Sun, M.H. Tan, J.Q. Xiao, D.H. Guan, R.F. Huang, L.S. Wen,
"Optical and electrical properties of direct-current magnetron sputtered
ZnO:Al films," J. Appl. Phys. Vol. 90, pp. 3432, 2001.
[23] A. Indluru, T.L. Alford, "Effect of Ag thickness on electrical transport
and optical properties of indium tin oxide/Ag/indium tin oxide
multilayers", J. Appl. Phys. vol.105, pp. 123528, 2009.
[24] Park K C, Ma D Y and Kim K H., "The physical properties of Al doped
zinc oxide films prepared by RF magnetron sputtering," Thin Solid Films.
vol. 305, pp. 201-209, 1997.
[25] K. Sivaramakrishnan, N. D. Theodore, J. F. Moulder and T. L. Alford,
"The role of copper in ZnO/Cu/ZnO thin films for flexible electronics," J.
Appl. Phys. vol. 106, pp. 063510, 2009.
[26] G. Haacke, "New figure of merit for transparent conductors", J. Appl.
Phys. vol. 47, pp. 4086-4089, 1976.
@article{"International Journal of Chemical, Materials and Biomolecular Sciences:50477", author = "Hung-Wei Wu and Chien-Hsun Chu and Ru-Yuan Yang and Chin-Min Hsiung", title = "Effects of Mo Thickness on the Properties of AZO/Mo/AZO Multilayer Thin Films", abstract = "In this paper, we proposed the effects of Mo thickness
on the properties of AZO/Mo/AZO multilayer thin films for
opto-electronics applications. The structural, optical and electrical
properties of AZO/Mo/AZO thin films were investigated.
Optimization of the thin films coatings resulted with low resistivity of
9.98 × 10-5 )-cm, mobility of 12.75 cm2/V-s, carrier concentration of
1.05 × 1022 cm-3, maximum transmittance of 79.13% over visible
spectrum of 380 – 780 nm and Haacke figure of merit (FOM) are 5.95
× 10-2 )-1 under Mo layer thickness of 15 nm. These results indicate an
alternative candidate for use as a transparent electrode in solar cells
and various displays applications.", keywords = "Aluminum-doped zinc oxide, AZO, multilayer, RF
magnetron sputtering, AZO/Mo/AZO, thin film, transparent
conductive oxides.", volume = "6", number = "11", pages = "989-4", }
