Abstract: RF magnetron sputtering is used on the ceramic targets,
each of which contains zinc oxide (ZnO), zinc oxide doped with
aluminum (AZO) and zinc oxide doped with gallium (GZO). The XRD
analysis showed a preferred orientation along the (002) plane for ZnO,
AZO, and GZO films. The AZO film had the best electrical properties;
it had the lowest resistivity of 6.6 × 10-4 cm, the best sheet resistance of
2.2 × 10-1 Ω/square, and the highest carrier concentration of 4.3 × 1020
cm-3, as compared to the ZnO and GZO films.