Abstract: Invention of transistor is the foundation of electronics industry. Metal Oxide Semiconductor Field Effect Transistor (MOSFET) has been the key for the development of nanoelectronics technology. In the first part of this manuscript, we present a new generation of MOSFET transistors based on SOI (Silicon-On-Insulator) technology. It is a partially depleted Silicon-On-Insulator (PD SOI MOSFET) transistor simulated by using SILVACO software. This work was completed by the presentation of some results concerning the influence of parameters variation (channel length L and gate oxide thickness Tox) on our PDSOI n-MOSFET structure on its drain current and kink effect.
Abstract: A vertical SOI-based MOSFET with trench body
structure operated as 1T DRAM cell at various temperatures has been
studied and investigated. Different operation temperatures are
assigned for the device for its performance comparison, thus the
thermal stability is carefully evaluated for the future memory device
applications. Based on the simulation, the vertical SOI-based
MOSFET with trench body structure demonstrates the electrical
characteristics properly and possess conspicuous kink effect at
various operation temperatures. Transient characteristics were also
performed to prove that its programming window values and
retention time behaviors are acceptable when the new 1T DRAM cell
is operated at high operation temperature.