Vertical Micromirror Fabrication by X-ray Lithography for Single Mode Optical Fiber Switching Applications
Inthis paper, design and fabrication of vertical
micromirror for optical switching applications of single mode optical
fibers are proposed. The structure of micromirror will be created
from negative photoresist (SU-8) on X-ray lithography using X-ray
from synchrotron light source. The properties of X-ray from
synchrotron light source are high-energy electrons which can
construct materials that have a high aspect ratio. In addition, the
technique of gold coating of reflective material has been used for
change direction of light between two pairs of optical fibers. At a
wavelength of 1310 nm with minimum average loss of 5.305 dB is
obtained.
[1] C. Marxer, C. Thio, M.-A. Grétillat, N. F. de Rooij, R. Batting, O.
Anthamatten, B. Valk, and P. Vogel. "Vertical Mirrors Fabricated by
Deep Reactive Ion Etching for Fiber-Optic Switching Applications",
Journal of Microelectromechanical Systems, vol.6, no.3, pp. 277-285,
Sep. 2003.
[2] O.V. Makarova, R. Divan, J. Tucek, K. Kreischer, P.T. Amstutz, D.C.
Mancini, C.-M. Tang. "Fabrication of Solid Copper 220 GHz Folded
Waveguide Circuits by UV Lithography", 2010 IEEE International
Vacuum Electronics Conference (IVEC), pp. 183-184, 2010.
[3] R. Phatthanakun, M. Mapato, W. Wanburee, S. Promwikorn, N.
Chathirat, P. Songsiriritthigul, P. Klysubun and N. Chomnawang.
"Copier Transparency as a Transparent Support for X-ray Mask
Absorber." International Conference on Materials for Advanced
Technologies - ICMAT, Singapore, July 1-7, 2007.
[1] C. Marxer, C. Thio, M.-A. Grétillat, N. F. de Rooij, R. Batting, O.
Anthamatten, B. Valk, and P. Vogel. "Vertical Mirrors Fabricated by
Deep Reactive Ion Etching for Fiber-Optic Switching Applications",
Journal of Microelectromechanical Systems, vol.6, no.3, pp. 277-285,
Sep. 2003.
[2] O.V. Makarova, R. Divan, J. Tucek, K. Kreischer, P.T. Amstutz, D.C.
Mancini, C.-M. Tang. "Fabrication of Solid Copper 220 GHz Folded
Waveguide Circuits by UV Lithography", 2010 IEEE International
Vacuum Electronics Conference (IVEC), pp. 183-184, 2010.
[3] R. Phatthanakun, M. Mapato, W. Wanburee, S. Promwikorn, N.
Chathirat, P. Songsiriritthigul, P. Klysubun and N. Chomnawang.
"Copier Transparency as a Transparent Support for X-ray Mask
Absorber." International Conference on Materials for Advanced
Technologies - ICMAT, Singapore, July 1-7, 2007.
@article{"International Journal of Electrical, Electronic and Communication Sciences:50609", author = "R. Chimchang and R. Tongta and R. Phatthanakun", title = "Vertical Micromirror Fabrication by X-ray Lithography for Single Mode Optical Fiber Switching Applications", abstract = "Inthis paper, design and fabrication of vertical
micromirror for optical switching applications of single mode optical
fibers are proposed. The structure of micromirror will be created
from negative photoresist (SU-8) on X-ray lithography using X-ray
from synchrotron light source. The properties of X-ray from
synchrotron light source are high-energy electrons which can
construct materials that have a high aspect ratio. In addition, the
technique of gold coating of reflective material has been used for
change direction of light between two pairs of optical fibers. At a
wavelength of 1310 nm with minimum average loss of 5.305 dB is
obtained.", keywords = "vertical micromirror, negative photoresist,X-ray
lithography", volume = "6", number = "5", pages = "477-4", }