Abstract: In this paper, we propose a geometric modeling of
illumination on the patterned image containing etching transistor. This
image is captured by a commercial camera during the inspection of
a TFT-LCD panel. Inspection of defect is an important process in the
production of LCD panel, but the regional difference in brightness,
which has a negative effect on the inspection, is due to the uneven
illumination environment. In order to solve this problem, we present
a geometric modeling of illumination consisting of an interpolation
using the least squares method and 3D modeling using bezier surface.
Our computational time, by using the sampling method, is shorter
than the previous methods. Moreover, it can be further used to correct
brightness in every patterned image.