Abstract: Vertical Double Gate (DG) Metal Oxide Semiconductor Field Effect Transistor (MOSFET) is believed to suppress various short channel effect problems. The gate to channel coupling in vertical DG-MOSFET are doubled, thus resulting in higher current density. By having two gates, both gates are able to control the channel from both sides and possess better electrostatic control over the channel. In order to ensure that the transistor possess a superb turn-off characteristic, the subs-threshold swing (SS) must be kept at minimum value (60-90mV/dec). By utilizing SILVACO TCAD software, an n-channel vertical DG-MOSFET was successfully designed while keeping the sub-threshold swing (SS) value as minimum as possible. From the observation made, the value of sub-threshold swing (SS) was able to be varied by adjusting the height of the silicon pillar. The minimum value of sub-threshold swing (SS) was found to be 64.7mV/dec with threshold voltage (VTH) of 0.895V. The ideal height of the vertical DG-MOSFET pillar was found to be at 0.265 µm.
Abstract: In this paper electrical characteristics of various kinds
of multiple-gate silicon nanowire transistors (SNWT) with the
channel length equal to 7 nm are compared. A fully ballistic quantum
mechanical transport approach based on NEGF was employed to
analyses electrical characteristics of rectangular and cylindrical
silicon nanowire transistors as well as a Double gate MOS FET. A
double gate, triple gate, and gate all around nano wires were studied
to investigate the impact of increasing the number of gates on the
control of the short channel effect which is important in nanoscale
devices. Also in the case of triple gate rectangular SNWT inserting
extra gates on the bottom of device can improve the application of
device. The results indicate that by using gate all around structures
short channel effects such as DIBL, subthreshold swing and delay
reduces.