Abstract: Non-polar a-plane AlGaN epilayers of high structural quality have been grown on r-sapphire substrate by using metalorganic chemical vapor deposition (MOCVD). A graded non-polar AlGaN buffer layer with variable aluminium concentration was used to improve the structural quality of the non-polar a-plane AlGaN epilayer. The characterisations were carried out by high-resolution X-ray diffraction (HR-XRD), atomic force microscopy (AFM) and Hall effect measurement. The XRD and AFM results demonstrate that the Al-composition-graded non-polar AlGaN buffer layer significantly improved the crystalline quality and the surface morphology of the top layer. A low root mean square roughness 1.52 nm is obtained from AFM, and relatively low background carrier concentration down to 3.9× cm-3 is obtained from Hall effect measurement.
Abstract: Additive Manufacturing is utilized in medical automation to optimize and integrate materials in accordance to energy source type leading to treatment gaps in industrial designs for extreme biomechanical forces in relation with vibration, fluid transfer, and multi-physics performance. Elastic/piezoelectric materials are strongly ordered inter-metallics for characterization of distinct features that can provide excellent compositional strength, ductility, and uniformity for superelastic shape memory alloy on medical devices. Several theories can be derived to analyze and interpret complex problems on the application of functionally graded materials used in medical machinery for genome architecture. Numerical principles on fluid and thermodynamics such as Reynolds number, Darcy rule, Friction Factor and Heat Rate are integrated with fundamental equation of numerical vibrations using Helmholtz equation. Simulation by Large Eddy approach and genetic modeling can be done using Physical and Chemical Vapor Deposition following various theories on Carrera’s Unified Formulations by comparing with various Classical Plate Theories, Equivalent Single Layer Theories, Layer-Wise Theories, Zig-Zag Theories, and Mixed Refined Variational Theories. The subject is approached towards the application of ethical and legal problems in order to resolve issues on consent and return of results.
Abstract: Fluidization at vacuum pressure has been a topic that is of growing research interest. Several industrial applications (such as drying, extractive metallurgy, and chemical vapor deposition (CVD)) can potentially take advantage of vacuum pressure fluidization. Particularly, the fine chemical industry requires processing under safe conditions for thermolabile substances, and reduced pressure fluidized beds offer an alternative. Fluidized beds under vacuum conditions provide optimal conditions for treatment of granular materials where the reduced gas pressure maintains an operational environment outside of flammability conditions. The fluidization at low-pressure is markedly different from the usual gas flow patterns of atmospheric fluidization. The different flow regimes can be characterized by the dimensionless Knudsen number. Nevertheless, hydrodynamics of bubbling vacuum fluidized beds has not been investigated to author’s best knowledge. In this work, the two-fluid numerical method was used to determine the impact of reduced pressure on the fundamental properties of a fluidized bed. The slip flow model implemented by Ansys Fluent User Defined Functions (UDF) was used to determine the interphase momentum exchange coefficient. A wide range of operating pressures was investigated (1.01, 0.5, 0.25, 0.1 and 0.03 Bar). The gas was supplied by a uniform inlet at 1.5Umf and 2Umf. The predicted minimum fluidization velocity (Umf) shows excellent agreement with the experimental data. The results show that the operating pressure has a notable impact on the bed properties and its hydrodynamics. Furthermore, it also shows that the existing Gorosko correlation that predicts bed expansion is not applicable under reduced pressure conditions.
Abstract: In this paper, an experimental and theoretical study of the processes of mesoporous silicon carbonization during the formation of buffer layers for the subsequent epitaxy of 3C-SiC films and related wide-band-gap semiconductors is performed. Experimental samples were obtained by the method of chemical vapor deposition and investigated by scanning electron microscopy. Analytic expressions were obtained for the effective diffusion factor and carbon atoms diffusion length in a porous system. The proposed model takes into account the processes of Knudsen diffusion, coagulation and overgrowing of pores during the formation of a silicon carbide layer.
Abstract: Single-walled carbon nanotubes (SWCNTs) are generally synthesized by chemical vapor deposition (CVD) using Fe, Co, and Ni as catalysts. However, due to the Ostwald ripening of metal catalysts, the diameter distribution of the grown SWCNTs is considerably wide (>2 nm), which is not suitable for electronics applications. In addition, reduction in the growth temperature is desirable for fabricating SWCNT devices compatible with the LSI process. Herein, we performed SWCNT growth by alcohol catalytic CVD using platinum-group metal catalysts (Pt, Rh, and Pd) because these metals have high melting points, and the reduction in the Ostwald ripening of catalyst particles is expected. Our results revealed that web-like SWCNTs were obtained from Pt and Rh catalysts at growth temperature between 500 °C and 600 °C by optimizing the ethanol pressure. The SWCNT yield from Pd catalysts was considerably low. By decreasing the growth temperature, the diameter and chirality distribution of SWCNTs from Pt and Rh catalysts became small and narrow. In particular, the diameters of most SWCNTs grown using Pt catalysts were below 1 nm and their diameter distribution was considerably narrow. On the contrary, SWCNTs can grow from Rh catalysts even at 300 °C by optimizing the growth condition, which is the lowest temperature recorded for SWCNT growth. Our results demonstrated that platinum-group metals are useful for the growth of small-diameter SWCNTs and facilitate low-temperature growth.
Abstract: The miniaturization of circuits is advancing. During chip manufacturing, structures are filled for example by metal organic chemical vapor deposition (MOCVD). Since this process reaches its limits in case of very high aspect ratios, the use of alternatives such as the atomic layer deposition (ALD) is possible, requiring the extension of existing coating systems. However, it is an unsolved question to what extent MOCVD can achieve results similar as an ALD process. In this context, this work addresses the characterization of a metal organic vapor deposition of titanium nitride. Based on the current state of the art, the film properties coating thickness, sheet resistance, resistivity, stress and chemical composition are considered. The used setting parameters are temperature, plasma gas ratio, plasma power, plasma treatment time, deposition time, deposition pressure, number of cycles and TDMAT flow. The derived process instructions for unstructured wafers and inside a structure with high aspect ratio include lowering the process temperature and increasing the number of cycles, the deposition and the plasma treatment time as well as the plasma gas ratio of hydrogen to nitrogen (H2:N2). In contrast to the current process configuration, the deposited titanium nitride (TiN) layer is more uniform inside the entire test structure. Consequently, this paper provides approaches to employ the MOCVD for structures with increasing aspect ratios.
Abstract: Chemical vapor deposition (CVD) diamond coated
cutting tool has excellent cutting performance, it is the most ideal tool
for the processing of nonferrous metals and alloys, composites,
nonmetallic materials and other difficult-to-machine materials
efficiently and accurately. Depositing CVD diamond coating on the
cemented carbide with high cobalt content can improve its toughness
and strength, therefore, it is very important to research on the
preparation technology and cutting properties of CVD diamond coated
cemented carbide cutting tool with high cobalt content. The
preparation technology of boron-doped diamond (BDD) coating has
been studied and the coated drills were prepared. BDD coating were
deposited on the drills by using the optimized parameters and the SEM
results show that there are no cracks or collapses in the coating.
Cutting tests with the prepared drills against the silumin and aluminum
base printed circuit board (PCB) have been studied. The results show
that the wear amount of the coated drill is small and the machined
surface has a better precision. The coating does not come off during
the test, which shows good adhesion and cutting performance of the
drill.
Abstract: Carbon nanotube is one of the most attractive materials
for the potential applications of nanotechnology due to its excellent
mechanical, thermal, electrical and optical properties. In this paper we
report a supercapacitor made of nickel foil electrodes, coated with
multiwall carbon nanotubes (MWCNTs) thin film using
electrophoretic deposition (EPD) method. Chemical vapor deposition
method was used for the growth of MWCNTs and ethanol was used as
a hydrocarbon source. High graphitic multiwall carbon nanotube was
found at 750oC analyzing by Raman spectroscopy. We observed the
electrochemical performance of supercapacitor by cyclic
voltammetry. The electrodes of supercapacitor fabricated from
MWCNTs exhibit considerably small equivalent series resistance
(ESR), and a high specific power density. Electrophoretic deposition
is an easy method in fabricating MWCNT electrodes for high
performance supercapacitor.
Abstract: The hydrogenated amorphous carbon films (α-C:H)
were deposited on p-type Si (100) substrates at different thicknesses by
radio frequency plasma enhanced chemical vapor deposition
technique (rf-PECVD). Raman spectra display asymmetric
diamond-like carbon (DLC) peaks, representative of the α-C:H films.
The decrease of intensity ID/IG ratios revealed the sp3 content arise at
different thicknesses of the α-C:H films. In terms of mechanical
properties, the high hardness and elastic modulus values showed the
elastic and plastic deformation behaviors related to sp3 content in
amorphous carbon films. Electrochemical properties showed that the
α-C:H films exhibited excellent corrosion resistance in air-saturated
3.5 wt.% NaCl solution for pH 2 at room temperature. Thickness
increasing affected the small sp2 clusters in matrix, restricting the
velocity transfer and exchange of electrons. The deposited α-C:H films
exhibited excellent mechanical properties and corrosion resistance.
Abstract: Polymer-like organic thin films were deposited on both
aluminum alloy type 6061 and glass substrates at room temperature by
Plasma Enhanced Chemical Vapor Deposition (PECVD) methodusing
benzene and hexamethyldisiloxane (HMDSO) as precursor materials.
The surface and physical properties of plasma-polymerized organic
thin films were investigated at different r.f. powers. The effects of
benzene/argon ratio on the properties of plasma polymerized benzene
films were also investigated. It is found that using benzene alone
results in a non-coherent and non-adherent powdery deposited
material. The chemical structure and surface properties of the asgrown
plasma polymerized thin films were analyzed on glass
substrates with FTIR and contact angle measurements. FTIR spectra
of benzene deposited film indicated that the benzene rings are
preserved when increasing benzene ratio and/or decreasing r.f.
powers. FTIR spectra of HMDSO deposited films indicated an
increase of the hydrogen concentration and a decrease of the oxygen
concentration with the increase of r.f. power. The contact angle (θ) of
the films prepared from benzene was found to increase by about 43%
as benzene ratio increases from 10% to 20%. θ was then found to
decrease to the original value (51°) when the benzene ratio increases
to 100%. The contact angle, θ, for both benzene and HMDSO
deposited films were found to increase with r.f. power. This signifies
that the plasma polymerized organic films have substantially low
surface energy as the r.f power increases. The corrosion resistance of
aluminum alloy substrate both bare and covered with plasma
polymerized thin films was carried out by potentiodynamic
polarization measurements in standard 3.5 wt. % NaCl solution at
room temperature. The results indicate that the benzene and HMDSO
deposited films are suitable for protection of the aluminum substrate
against corrosion. The changes in the processing parameters seem to
have a strong influence on the film protective ability. Surface
roughness of films deposited on aluminum alloy substrate was
investigated using scanning electron microscopy (SEM). The SEM
images indicate that the surface roughness of benzene deposited films
increase with decreasing the benzene ratio. SEM images of benzene
and HMDSO deposited films indicate that the surface roughness
decreases with increasing r.f. power. Studying the above parameters
indicate that the films produced are suitable for specific practical
applications.
Abstract: The carbon based coils with the nanometer scale have
the 3 dimension helix geometry. We synthesized the carbon nano-coils
by the use of chemical vapor deposition technique with iron and tin as
the catalysts. The fabricated coils have the external diameter of
ranging few hundred nm to few thousand nm. The Scanning
Electro-Microscope (SEM) and Tunneling Electro-Microscope has
shown detail images of the coil-s structure. The fabrication of the
carbon nano-coils can be grown on the metal and non-metal substrates,
such as the stainless steel and silicon substrates. Besides growth on the
flat substrate; they also can be grown on the stainless steel wires. After
the synthesis of the coils, the mechanical and electro-mechanical
property is measured. The experimental results were reported.
Abstract: novel and simple method is introduced for rapid and
highly efficient water treatment by reverse osmosis (RO) method using
multi-walled carbon nanotubes (MWCNTs) / polyacrylonitrile (PAN)
polymer as a flexible, highly efficient, reusable and semi-permeable
mixed matrix membrane (MMM). For this purpose, MWCNTs were
directly synthesized and on-line purified by chemical vapor deposition
(CVD) process, followed by directing the MWCNT bundles towards an
ultrasonic bath, in which PAN polymer was simultaneously suspended
inside a solid porous silica support in water at temperature to ~70 οC.
Fabrication process of MMM was finally completed by hot isostatic
pressing (HIP) process. In accordance with the analytical figures of
merit, the efficiency of fabricated MMM was ~97%. The rate of water
treatment process was also evaluated to 6.35 L min-1. The results reveal
that, the CNT-based MMM is suitable for rapid treatment of different
forms of industrial, sea, drinking and well water samples.
Abstract: Chemical vapor deposition method was used to
produce carbon nanotubes on an iron based catalyst from acetylene.
Gas-phase samples collected from the different positions of the tubular reactor were analyzed by GC/MS. A variety of species ranging from hydrogen to naphthalene were observed and changes in their concentrations were plotted against the reactor position. Briefly benzene, toluene, styrene, indene and naphthalene were the main
higher molecular weight species and vinylacetylene and diacetylene were the important intermediates. Nanotube characterization was performed by scanning electron microscopy and transmission electron microscopy.
Abstract: The substrate heater designed for this investigation is a front side substrate heating system. It consists of 10 conventional tungsten halogen lamps and an aluminum reflector, total input electrical power of 5 kW. The substrate is heated by means of a radiation from conventional tungsten halogen lamps directed to the substrate through a glass window. This design allows easy replacement of the lamps and maintenance of the system. Within 2 to 6 minutes the substrate temperature reaches 500 to 830 C by varying the vertical distance between the glass window and the substrate holder. Moreover, the substrate temperature can be easily controlled by controlling the input power to the system. This design gives excellent opportunity to deposit many deferent films at deferent temperatures in the same deposition time. This substrate heater was successfully used for Chemical Vapor Deposition (CVD) of many thin films, such as Silicon, iron, etc.
Abstract: In this paper we present discretization and decomposition methods for a multi-component transport model of a chemical vapor deposition (CVD) process. CVD processes are used to manufacture deposition layers or bulk materials. In our transport model we simulate the deposition of thin layers. The microscopic model is based on the heavy particles, which are derived by approximately solving a linearized multicomponent Boltzmann equation. For the drift-process of the particles we propose diffusionreaction equations as well as for the effects of heat conduction. We concentrate on solving the diffusion-reaction equation with analytical and numerical methods. For the chemical processes, modelled with reaction equations, we propose decomposition methods and decouple the multi-component models to simpler systems of differential equations. In the numerical experiments we present the computational results of our proposed models.
Abstract: Carbon nanotubes (CNTs) with their high mechanical,
electrical, thermal and chemical properties are regarded as promising
materials for many different potential applications. Having unique
properties they can be used in a wide range of fields such as
electronic devices, electrodes, drug delivery systems, hydrogen
storage, textile etc. Catalytic chemical vapor deposition (CCVD) is a
common method for CNT production especially for mass production.
Catalysts impregnated on a suitable substrate are important for
production with chemical vapor deposition (CVD) method. Iron
catalyst and MgO substrate is one of most common catalyst-substrate
combination used for CNT. In this study, CNTs were produced by
CCVD of acetylene (C2H2) on magnesium oxide (MgO) powder
substrate impregnated by iron nitrate (Fe(NO3)3•9H2O) solution. The
CNT synthesis conditions were as follows: at synthesis temperatures
of 500 and 800°C multiwall and single wall CNTs were produced
respectively. Iron (Fe) catalysts were prepared by with Fe:MgO ratio
of 1:100, 5:100 and 10:100. The duration of syntheses were 30 and
60 minutes for all temperatures and catalyst percentages. The
synthesized materials were characterized by thermal gravimetric
analysis (TGA), transmission electron microscopy (TEM) and Raman
spectroscopy.
Abstract: Titanium nitride (TiN) has been synthesized using the
sheet plasma negative ion source (SPNIS). The parameters used for
its effective synthesis has been determined from previous
experiments and studies. In this study, further enhancement of the
deposition rate of TiN synthesis and advancement of the SPNIS
operation is presented. This is primarily achieved by the addition of
Sm-Co permanent magnets and a modification of the configuration in
the TiN deposition process. The magnetic enhancement is aimed at
optimizing the sputtering rate and the sputtering yield of the process.
The Sm-Co permanent magnets are placed below the Ti target for
better sputtering by argon. The Ti target is biased from –250V to –
350V and is sputtered by Ar plasma produced at discharge current of
2.5–4A and discharge potential of 60–90V. Steel substrates of
dimensions 20x20x0.5mm3 were prepared with N2:Ar volumetric
ratios of 1:3, 1:5 and 1:10. Ocular inspection of samples exhibit
bright gold color associated with TiN. XRD characterization
confirmed the effective TiN synthesis as all samples exhibit the (200)
and (311) peaks of TiN and the non-stoichiometric Ti2N (220) facet.
Cross-sectional SEM results showed increase in the TiN deposition
rate of up to 0.35μm/min. This doubles what was previously obtained
[1]. Scanning electron micrograph results give a comparative
morphological picture of the samples. Vickers hardness results gave
the largest hardness value of 21.094GPa.
Abstract: Carbon nanotubes (CNTs) possess unique structural,
mechanical, thermal and electronic properties, and have been
proposed to be used for applications in many fields. However, to
reach the full potential of the CNTs, many problems still need to be
solved, including the development of an easy and effective
purification procedure, since synthesized CNTs contain impurities,
such as amorphous carbon, carbon nanoparticles and metal particles.
Different purification methods yield different CNT characteristics
and may be suitable for the production of different types of CNTs. In
this study, the effect of different purification chemicals on carbon
nanotube quality was investigated. CNTs were firstly synthesized by
chemical vapor deposition (CVD) of acetylene (C2H2) on a
magnesium oxide (MgO) powder impregnated with an iron nitrate
(Fe(NO3)3·9H2O) solution. The synthesis parameters were selected
as: the synthesis temperature of 800°C, the iron content in the
precursor of 5% and the synthesis time of 30 min. The liquid phase
oxidation method was applied for the purification of the synthesized
CNT materials. Three different acid chemicals (HNO3, H2SO4, and
HCl) were used in the removal of the metal catalysts from the
synthesized CNT material to investigate the possible effects of each
acid solution to the purification step. Purification experiments were
carried out at two different temperatures (75 and 120 °C), two
different acid concentrations (3 and 6 M) and for three different time
intervals (6, 8 and 15 h). A 30% H2O2 : 3M HCl (1:1 v%) solution
was also used in the purification step to remove both the metal
catalysts and the amorphous carbon. The purifications using this
solution were performed at the temperature of 75°C for 8 hours.
Purification efficiencies at different conditions were evaluated by
thermogravimetric analysis. Thermal and electrical properties of
CNTs were also determined. It was found that the obtained electrical
conductivity values for the carbon nanotubes were typical for organic
semiconductor materials and thermal stabilities were changed
depending on the purification chemicals.