Characterization of Microroughness Parameters in Cu and Cu2O Nanoparticles Embedded in Carbon Film
The morphological parameter of a thin film surface
can be characterized by power spectral density (PSD) functions
which provides a better description to the topography than the RMS
roughness and imparts several useful information of the surface
including fractal and superstructure contributions. Through the
present study Nanoparticle copper/carbon composite films were
prepared by co-deposition of RF-Sputtering and RF-PECVD method
from acetylene gas and copper target. Surface morphology of thin
films is characterized by using atomic force microscopy (AFM). The
Carbon content of our films was obtained by Rutherford Back
Scattering (RBS) and it varied from .4% to 78%. The power values of
power spectral density (PSD) for the AFM data were determined by
the fast Fourier transform (FFT) algorithms. We investigate the effect
of carbon on the roughness of thin films surface. Using such
information, roughness contributions of the surface have been
successfully extracted.
[1] T. Jiang, N. Hall, A. Ho, S. Morin, Thin Solid Films 471 (2005) 76- 85.
[2] A.A. Gewirth, B.K. Niece, Chem. Rev. 97 (1997) 1129.
[3] D.M. Kolb, Electrochim. Acta 45 (2000) 2387..
[4] O.M. Magnussen, F.A. Moller, A. Lachenwitzer, R.J. Behm,
Electrochemical Synthesis and Modification of Materials, Materials
Research Society Symposium Proceedings, vol. 451, 1997, p. 43.
[5] G. Binnig, C.F. Quate, C. Gerber, Phys. Rev. Lett. 56 (1986) 930.
[6] J.M. Bennett, L. Mattson, Introduction to Surface Roughness and
Scattering, Optical Society of America, Washington, DC, 1989.
[7] W. Kwa'sny, L.A. Dobrza'nski, M. Pawlyta, W. Gulbi'nski, J. Mater.
Process. Technol. 157-158 (2004) 188-193.
[8] Taketsugu Itoh, Noriyoshi Yamauchi, Applied Surface Science 253
(2007) 6196-6202.
[9] S. Jakobs, A. Duparre, H. Truckenbrodt, Interfacial roughness and
related scatter in ultraviolet optical coatings: a systematic experimental
approach, Appl. Opt. 37 (7) (1998) 1180-1193.
[10] J.F. Borrull, A. Duparre, E. Quesnel, Procedure to characterize
microroughness of optical thin films: application to ion-beam-sputtered
vacuum-ultraviolet coatings, Appl. Opt. 40 (13) (2001) 2190-2199.
[11] J.P. Singh, R. Singh, N.C. Mishra, D. Kanjilal, V. Ganesan,
Temperaturedependent roughness of electronically excited InP surfaces,
J. Appl. Phys. 90 (12) (2001) 5968-5972
[12] T. Ghodselahi, M.A. Vesaghi, A. Shafiekhani, A. Baradaran, A. Karimi,
Z. Mobini, Co-deposition process of RF-Sputtering and RF-PECVD of
copper/carbon nanocomposite films, Surface & Coatings Technology
202 (2008) 2731-2736.
[1] T. Jiang, N. Hall, A. Ho, S. Morin, Thin Solid Films 471 (2005) 76- 85.
[2] A.A. Gewirth, B.K. Niece, Chem. Rev. 97 (1997) 1129.
[3] D.M. Kolb, Electrochim. Acta 45 (2000) 2387..
[4] O.M. Magnussen, F.A. Moller, A. Lachenwitzer, R.J. Behm,
Electrochemical Synthesis and Modification of Materials, Materials
Research Society Symposium Proceedings, vol. 451, 1997, p. 43.
[5] G. Binnig, C.F. Quate, C. Gerber, Phys. Rev. Lett. 56 (1986) 930.
[6] J.M. Bennett, L. Mattson, Introduction to Surface Roughness and
Scattering, Optical Society of America, Washington, DC, 1989.
[7] W. Kwa'sny, L.A. Dobrza'nski, M. Pawlyta, W. Gulbi'nski, J. Mater.
Process. Technol. 157-158 (2004) 188-193.
[8] Taketsugu Itoh, Noriyoshi Yamauchi, Applied Surface Science 253
(2007) 6196-6202.
[9] S. Jakobs, A. Duparre, H. Truckenbrodt, Interfacial roughness and
related scatter in ultraviolet optical coatings: a systematic experimental
approach, Appl. Opt. 37 (7) (1998) 1180-1193.
[10] J.F. Borrull, A. Duparre, E. Quesnel, Procedure to characterize
microroughness of optical thin films: application to ion-beam-sputtered
vacuum-ultraviolet coatings, Appl. Opt. 40 (13) (2001) 2190-2199.
[11] J.P. Singh, R. Singh, N.C. Mishra, D. Kanjilal, V. Ganesan,
Temperaturedependent roughness of electronically excited InP surfaces,
J. Appl. Phys. 90 (12) (2001) 5968-5972
[12] T. Ghodselahi, M.A. Vesaghi, A. Shafiekhani, A. Baradaran, A. Karimi,
Z. Mobini, Co-deposition process of RF-Sputtering and RF-PECVD of
copper/carbon nanocomposite films, Surface & Coatings Technology
202 (2008) 2731-2736.
@article{"International Journal of Chemical, Materials and Biomolecular Sciences:49151", author = "S.Solaymani and T.Ghodselahi and N.B.Nezafat and H.Zahrabi and A.Gelali", title = "Characterization of Microroughness Parameters in Cu and Cu2O Nanoparticles Embedded in Carbon Film", abstract = "The morphological parameter of a thin film surface
can be characterized by power spectral density (PSD) functions
which provides a better description to the topography than the RMS
roughness and imparts several useful information of the surface
including fractal and superstructure contributions. Through the
present study Nanoparticle copper/carbon composite films were
prepared by co-deposition of RF-Sputtering and RF-PECVD method
from acetylene gas and copper target. Surface morphology of thin
films is characterized by using atomic force microscopy (AFM). The
Carbon content of our films was obtained by Rutherford Back
Scattering (RBS) and it varied from .4% to 78%. The power values of
power spectral density (PSD) for the AFM data were determined by
the fast Fourier transform (FFT) algorithms. We investigate the effect
of carbon on the roughness of thin films surface. Using such
information, roughness contributions of the surface have been
successfully extracted.", keywords = "Atomic force microscopy, Fast Fourier transform,Power spectral density, RBS.", volume = "5", number = "4", pages = "243-4", }